Demonstration of Controlling the Spatiotemporal Dynamics of Optical Near-Field Excitation Transfer in Y-Junction Structure Consisting of Randomly Distributed Quantum Dots
Figure 2
(a) Cross-sectional illustrations of sample fabrication process. (i) E-beam resist is applied to SiO2 substrate, and regions where QD2 structures are to be formed are drawn by e-beam lithography. (ii) QD2 solution is dropped onto substrate and allowed to dry. (iii) E-beam resist is removed to obtain QD2 structures. (iv) E-beam resist is applied again. (v) Region where QD1 structure is to be formed is drawn by e-beam lithography. (vi) QD1 solution is dropped onto resist and allowed to dry. (vii) E-beam resist is removed to obtain the sample. (b) Fluorescence microscope image of sample excited by mercury vapor lamp.
