Editorial Board

Editor-in-Chief

Michael Z. Hu, Oak Ridge National Laboratory, USA

Advisory Board

James H. Adair, Pennsylvania State University, USA
C. Brinker, Sandia National Laboratory, USA
Taeghwan Hyeon, Seoul National University, South Korea
Nathan Lewis, California Institute of Technology, USA
Ed Ma, Worcester Polytechnic Institute, USA
Alon V Mccormick, University of Minnesota Minneapolis, USA
Gary L. Messing, Pennsylvania State University, USA
Zhonglin Wang, Georgia Institute of Technology, USA
Enge Wang, Chinese Academy of Sciences Institute of Physics , China
Alan Weimer, University of Colorado Boulder, USA
N. Xu, Nanjing University of Chemical Technology, China
Jackie Ying, Massachusetts Institute of Technology, USA

Associate Editors

Xuedong Bai, Chinese Academy of Sciences, China
John Bartlett, ANSTO Materials & Engineering Science, Australia
Theodorian Borca-Tasciuc, Rensselaer Polytechnic Institute, USA
Michael Harris, Purdue University, USA
Wanqin Jin, Nanjing University of Technolog, China
Do Kyung Kim, Korea Advanced Institute of Science and Technology, South Korea
Burtrand Lee, School of Materials Science and Engineering, Clemson University, USA
S. J. Liao, South China University of Technology, China
Gong-Ru Lin, National Taiwan University, Taiwan
Jun Liu, Pacific Northwest National Laboratory, USA
Sanjay Mathur, University of Cologne, Germany
Nobuhiro Matsushita, Materials and Structures Laboratory, Tokyo Institute of Technology, Japan
Sherine Obare, University of North Carolina at Charlotte, USA
Maryam Tabrizian, McGill University, Canada
Theodore T. Tsotsis, University of Southern California, USA
Michael S. Wong, Rice University, USA

Editorial Board

Donald A. Bansleben, Department of Homeland Security, USA
C. Brosseau, Université de Bretagne Occidentale, France
Siu Wai Chan, Columbia University, USA
Sang-Hee Cho, Kyungpook National University, South Korea
C. Cui, Hebei University of Technology, China
Ali Eftekhari, Materials and Energy Research Center, Iran
Claude Estournes, Institut Carnot CIRIMAT, France
Alan Fuchs, University of Nevada, Reno, USA
Lian Gao, Chinese Academy of Sciences, China
Hongcheng Gu, Shanghai Jiaotong University, China
Justin Holmes, University College Cork, Ireland
David Hui, University of New Orleans, USA
Rakesh K. Joshi, University of South Florida , USA
Alan K. T. Lau, The Hong Kong Polytechnic University, Hong Kong
Burtrand I. Lee, Clemson University, USA
Jun Li, National University of Singapore, Singapore
J. -Y. Liu, University of Missouri, St. Louis, USA
Songwei Lu, PPG Industries, USA
P. Panine, European Synchrotron Radiation Facility, France
Donglu Shi, University of Cincinnati, China
Bohua Sun, Cape Peninsula University of Technology, South Africa
Xiaogong Wang, Tsinghua University, China
Y. Wang, Pacific Northwest National Lab, USA
Ching Ping Wong, Georgia Institute of Technology, USA
Ping Xiao, University of Manchester, United Kingdom
Zhili Xiao, Northern Illinois University, USA
Doron Yadlovker, RAFAEL Ltd, Israel
Kui Yu, National Research Council, Canada