The Role of Annealing Treatment on Crystallographic, Optical, and Electrical Features of Bi<sub>2</sub>O<sub>3</sub> Thin Films Prepared Using Reactive Plasma Sputtering Technology

<div>(a) The reactive plasma sputtering system diagram, (b) the image of in-site lab system, and (c) glass lab slide samples with Bi<sub>2</sub>O<sub>3</sub> thin films.</div>

Journal of Nanotechnology

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Figure 1

Figure 1: The Role of Annealing Treatment on Crystallographic, Optical, and Electrical Features of Bi<sub>2</sub>O<sub>3</sub> Thin Films Prepared Using Reactive Plasma Sputtering Technology 

Figure 1 | The Role of Annealing Treatment on Crystallographic, Optical, and Electrical Features of Bi2O3 Thin Films Prepared Using Reactive Plasma Sputtering Technology 