The Role of Annealing Treatment on Crystallographic, Optical, and Electrical Features of Bi<sub>2</sub>O<sub>3</sub> Thin Films Prepared Using Reactive Plasma Sputtering Technology

<div>Bi<sub>2</sub>O<sub>3</sub> film plasma XRD patterns sputtered on glass substrates assisted different annealing treatments.</div>

Journal of Nanotechnology

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Figure 4

Figure 4: The Role of Annealing Treatment on Crystallographic, Optical, and Electrical Features of Bi<sub>2</sub>O<sub>3</sub> Thin Films Prepared Using Reactive Plasma Sputtering Technology 

Figure 4 | The Role of Annealing Treatment on Crystallographic, Optical, and Electrical Features of Bi2O3 Thin Films Prepared Using Reactive Plasma Sputtering Technology 