Symmetric Compound Parabolic Concentrator with Indium Tin Oxide Coated Glass as Passive Cooling System for Photovoltaic Application

Table 1

Comparison of transmittance of ITO films prepared by different methods.

Film deposition technique	Thickness (nm)	Substrate temperature (°C)	Resistivity (Ω cm)	Transmittance (%)	Reference
Chemical vapour deposition	—	350–450		90–95 (visible)	[19]
DC magnetron sputter	—	RT		85 (visible)	[21]
DC magnetron sputter	282	RT		94 (560 nm)	[24]
DC magnetron sputter	—	RT–453		70–90 (visible)	[19]
Electron beam evaporation	—	RT–440		80–90 (visible)	[19]
Electron beam evaporation	150	350		92 (visible)	[20]
Ion and electron beam evaporation	120	RT		90 (550 nm)	[26]
Pulsed laser deposition	—	RT		90 (750 nm)	[27]
Reactive evaporation	—	200		90 (visible)	[26]
RF magnetron sputter	1400	380		89 (visible)	[30]
RF magnetron sputter	900	400		87 (visible)	[31]
RF magnetron sputter	40	RT		92 (visible)	[32]
RF magnetron sputter		RT–450		85–90 (visible)	[19]
Sol-gel	250	260		90 (900 nm)	[28]
Sol-gel	—	500		90 (visible)	[19]
Spray pyrolysis	200–900	350–500		85–90 (visible)	[18]
Spray pyrolysis	—	420–677		82–92 (visible)	[19]
Thermal deposition	120	80		80 (visible)	[22]

Note: RT means room temperature.