Research Article

A Virtual Fabrication and High-Performance Design of 65 nm Nanocrystal Floating-Gate Transistor

Table 5

Nanocrystal floating-gate transistor performance comparison.

[17][19][20]This work

Device structure
 StructureNanocrystal (underlap channel)NanocrystalNanocrystalNanocrystalNanocrystalNanocrystal
 Underlap channel length (nm)8XXXXX
 Tunnel oxide thickness (nm)3.33.33.33.33.36
 Dot dimension [] (nm)XX
 Dot material/dimension [] (nm)Poly/Poly/Poly/Poly/Poly/Poly/
 IPD material/thickness (nm)SiO2/10SiO2/10SiO2/10SiO2/10SiO2/10SiO2/15
 Control gate material/thickness (nm)XXPoly/1000Aluminum/1000Aluminum/80Poly/80
Device performance
 W/E voltage (V)12/X12/X12/-1212/-1212/-1212/-12
 Memory window (V)3.12.51.271.082.510.1
Transient performance
 Write speed (s)0.30.30.170.051.850.05
 Erase speed (s)XX0.2150.1800.2

X was not available.